Tip-based chemical vapor deposition with a scanning nano-heater

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Abstract

In this preliminary effort, a moving nano-heater directs a chemical vapor deposition reaction (nano-CVD) demonstrating a tip-based nanofabrication (TBN) method. Localized nano-CVD of copper (Cu) and copper oxide (CuO) on a silicon (Si) and silicon oxide (SiO2) substrate from gasses, namely sublimated copper acetylacetonate (Cu(acac)2), argon (Ar), and oxygen (O2), is demonstrated. This technique is applicable to other materials.

Original languageEnglish
Article number133104
JournalApplied Physics Letters
Volume102
Issue number13
DOIs
StatePublished - 1 Apr 2013
Externally publishedYes

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