TY - JOUR
T1 - The preparation and mechanical properties of Al-containing a-C
T2 - HHHH thin films
AU - Zhang, Guangan
AU - Yan, Pengxun
AU - Wang, Peng
AU - Chen, Youming
AU - Zhang, Junyan
PY - 2007/11/7
Y1 - 2007/11/7
N2 - Al-containing hydrogenated amorphous carbon (Al-C : H) films were deposited on silicon substrates using a mid frequency magnetron sputtering Al target in an argon and methane gas mixture. The composition, surface morphology, hardness and friction coefficient of the films were characterized using x-ray photoelectron spectroscopy, atomic force microscopy, nanoindentation and tribological tester. The Al-C : H films deposited at low CH4 content show high surface roughness, low hardness and high friction coefficient, similar to metallic Al films; in contrast, the Al-C : H films prepared under high CH4 content indicate low surface roughness, high hardness and low friction coefficient, close to that of hard a-C : H films as wear-resistance films.
AB - Al-containing hydrogenated amorphous carbon (Al-C : H) films were deposited on silicon substrates using a mid frequency magnetron sputtering Al target in an argon and methane gas mixture. The composition, surface morphology, hardness and friction coefficient of the films were characterized using x-ray photoelectron spectroscopy, atomic force microscopy, nanoindentation and tribological tester. The Al-C : H films deposited at low CH4 content show high surface roughness, low hardness and high friction coefficient, similar to metallic Al films; in contrast, the Al-C : H films prepared under high CH4 content indicate low surface roughness, high hardness and low friction coefficient, close to that of hard a-C : H films as wear-resistance films.
UR - https://www.scopus.com/pages/publications/35548941284
U2 - 10.1088/0022-3727/40/21/039
DO - 10.1088/0022-3727/40/21/039
M3 - Article
AN - SCOPUS:35548941284
SN - 0022-3727
VL - 40
SP - 6748
EP - 6753
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 21
ER -