The effects of oxygen plasma radiation on a-C:H films

H. Y. Sang; W. J. Zhang; T. M. Wang

doi:10.1016/S0042-207X(02)00508-0

The effects of oxygen plasma radiation on a-C:H films

H. Y. Sang
, W. J. Zhang
, T. M. Wang

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition method with three different groups of processing parameters. After being radiated in oxygen plasma for 30 min, the properties of all the a-C:H changed significantly. In order to investigate the oxygen plasma effect, Raman spectroscopy, Fourier-transform infrared spectroscopy, atomic force microscopy and ellipsometry were performed. From the above test results, it can be inferred that oxygen plasma radiation is a feasible method to change the nature of a-C:H films.

Original language	English
Pages (from-to)	203-209
Number of pages	7
Journal	Vacuum
Volume	68
Issue number	2
DOIs	https://doi.org/10.1016/S0042-207X(02)00508-0
State	Published - 31 Oct 2002
Externally published	Yes

Keywords

a-C:H oxygen plasma effect

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Cite this

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title = "The effects of oxygen plasma radiation on a-C:H films",

abstract = "Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition method with three different groups of processing parameters. After being radiated in oxygen plasma for 30 min, the properties of all the a-C:H changed significantly. In order to investigate the oxygen plasma effect, Raman spectroscopy, Fourier-transform infrared spectroscopy, atomic force microscopy and ellipsometry were performed. From the above test results, it can be inferred that oxygen plasma radiation is a feasible method to change the nature of a-C:H films.",

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AU - Sang, H. Y.

AU - Zhang, W. J.

AU - Wang, T. M.

PY - 2002/10/31

Y1 - 2002/10/31

N2 - Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition method with three different groups of processing parameters. After being radiated in oxygen plasma for 30 min, the properties of all the a-C:H changed significantly. In order to investigate the oxygen plasma effect, Raman spectroscopy, Fourier-transform infrared spectroscopy, atomic force microscopy and ellipsometry were performed. From the above test results, it can be inferred that oxygen plasma radiation is a feasible method to change the nature of a-C:H films.

AB - Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition method with three different groups of processing parameters. After being radiated in oxygen plasma for 30 min, the properties of all the a-C:H changed significantly. In order to investigate the oxygen plasma effect, Raman spectroscopy, Fourier-transform infrared spectroscopy, atomic force microscopy and ellipsometry were performed. From the above test results, it can be inferred that oxygen plasma radiation is a feasible method to change the nature of a-C:H films.

KW - a-C:H oxygen plasma effect

UR - https://www.scopus.com/pages/publications/0037206614

U2 - 10.1016/S0042-207X(02)00508-0

DO - 10.1016/S0042-207X(02)00508-0

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VL - 68

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JO - Vacuum

JF - Vacuum

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The effects of oxygen plasma radiation on a-C:H films

Abstract

Keywords

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