Abstract
The interaction of CF3OCF2OCF3 on Al2O3 surface was investigated by Fourier transform infrared (FTIR) under both `vacuum' and `pressure' conditions. It was found that CF3OCF2OCF3 decomposed only under `pressure' conditions. Fluoroformate FCOO (ads) was formed and stayed adsorbed on the surface up to 550 K. The reactivities of CF3OCF2OCF3 and CF3OCF3 on Al2O3 surface are compared and the reaction mechanisms are also discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1-8 |
| Number of pages | 8 |
| Journal | Surface Science |
| Volume | 469 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1 Dec 2000 |
| Externally published | Yes |
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