Study on thiophene desulfurization mechanism over vanadium oxides under FCC condition

Peng Wang, Huiping Tian, Jun Long

Research output: Contribution to journalConference articlepeer-review


The reaction mechanism of thiophene on vanadium oxides under FCC operating conditions was studied using TPSR-MS method and continuous fixed-bed reaction, followed by characterization via IR pyridine adsorption-TPD method and XPS spectra. Conversion of thiophene on V2O5 at 500°C, a space velocity of 33.43/hr, and a catalyst/oil ratio of 1.54:1 could reach 15.9 wt %, including 12.4 wt % of sulfur converted into H2S. Conversion of thiophene during its reaction on single Lewis acid centers was very low. At 500°C, thiophene could enter into redox reaction with V2O5 and V2O4, which after losing some crystal lattices could be reduced into products with lower valence state such as V23, while thiophene was oxidized into CO, CO2, and SO2. The SO2 yield resulted from reaction of thiophene on V2O5 was much higher, because V2O5 had a stronger oxidizing ability. A few Bronsted acid sites existing on the surface of V2O5 resulted in a significant increase of H2S yield among the products derived from the reaction of thiophene. This is an abstract of a paper presented at the 231st ACS National Meeting (Atlanta, GA 3/26-30/2006).

Original languageEnglish
JournalACS National Meeting Book of Abstracts
StatePublished - 2006
Event231th ACS National Meeting - Atlanta, GA, United States
Duration: 26 Mar 200630 Mar 2006


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