Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
Xiaoman Peng, Yafei Wang, Jian Xu, Hua Yuan, Liangqian Wang, Tao Zhang, Xudong Guo, Shuangqing Wang, Yi Li, Guoqiang Yang
Research output: Contribution to journal › Article › peer-review
34Scopus
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