Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Xiaoman Peng; Yafei Wang; Jian Xu; Hua Yuan; Liangqian Wang; Tao Zhang; Xudong Guo; Shuangqing Wang; Yi Li; Guoqiang Yang

doi:10.1002/mame.201700654

Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Xiaoman Peng, Yafei Wang, Jian Xu, Hua Yuan, Liangqian Wang, Tao Zhang, Xudong Guo, Shuangqing Wang, Yi Li, Guoqiang Yang

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

Abstract

Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (T_d more than 160 °C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm⁻²), and good high aspect ratio patterns are obtained by using EUV lithography.

Original language	English
Article number	1700654
Journal	Macromolecular Materials and Engineering
Volume	303
Issue number	6
DOIs	https://doi.org/10.1002/mame.201700654
State	Published - Jun 2018
Externally published	Yes

Keywords

EUV
lithography
molecular glasses
photoresists

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10.1002/mame.201700654

Cite this

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title = "Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography",

abstract = "Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (Td more than 160 °C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm−2), and good high aspect ratio patterns are obtained by using EUV lithography.",

keywords = "EUV, lithography, molecular glasses, photoresists",

author = "Xiaoman Peng and Yafei Wang and Jian Xu and Hua Yuan and Liangqian Wang and Tao Zhang and Xudong Guo and Shuangqing Wang and Yi Li and Guoqiang Yang",

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year = "2018",

month = jun,

doi = "10.1002/mame.201700654",

language = "English",

volume = "303",

journal = "Macromolecular Materials and Engineering",

issn = "1438-7492",

publisher = "Wiley-VCH Verlag",

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T1 - Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

AU - Peng, Xiaoman

AU - Wang, Yafei

AU - Xu, Jian

AU - Yuan, Hua

AU - Wang, Liangqian

AU - Zhang, Tao

AU - Guo, Xudong

AU - Wang, Shuangqing

AU - Li, Yi

AU - Yang, Guoqiang

PY - 2018/6

Y1 - 2018/6

N2 - Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (Td more than 160 °C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm−2), and good high aspect ratio patterns are obtained by using EUV lithography.

AB - Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (Td more than 160 °C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm−2), and good high aspect ratio patterns are obtained by using EUV lithography.

KW - EUV

KW - lithography

KW - molecular glasses

KW - photoresists

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DO - 10.1002/mame.201700654

M3 - Article

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SN - 1438-7492

VL - 303

JO - Macromolecular Materials and Engineering

JF - Macromolecular Materials and Engineering

IS - 6

M1 - 1700654

ER -

Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Abstract

Keywords

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