Abstract
This paper details the study of the mechanism of large-grain polysilicon layer formations using metal-induced lateral crystallization (MILC). A model is proposed to predict the growth rate of MILC under the retardation effect of solid-phase crystallization (SPC) at different annealing conditions. The model has been extensively validated by experimental data. This paper will show that the SPC exists as a counter-effect to retard the MILC and degrade the superiority of the polysilicon layer. The model has been used to predict the MILC rate of large-grain polysilicon grown by a pulsed-annealing technique that suppresses the undesirable SPC effect. The model prediction agrees well with the experimental results.
| Original language | English |
|---|---|
| Pages (from-to) | 2205-2210 |
| Number of pages | 6 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 51 |
| Issue number | 12 |
| DOIs | |
| State | Published - 1 Dec 2004 |
| Externally published | Yes |
Keywords
- Crystallization
- Large-grain
- Polysilicon
- Thermal annealing
- Thin-film transistor (TFT)
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