Mixing of phosphorus and antimony ions in silicon by recoil implantation

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2 Scopus citations

Original language	English
Pages (from-to)	633-634
Number of pages	2
Journal	Journal of Materials Science Letters
Volume	5
Issue number	6
DOIs	https://doi.org/10.1007/BF01731532
State	Published - Jun 1986
Externally published	Yes

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@article{fedc808baf214b4f89b9b18ed79af3ee,

title = "Mixing of phosphorus and antimony ions in silicon by recoil implantation",

author = "Kwok, \{H. L.\} and Lam, \{Y. W.\} and Wong, \{S. P.\} and Poon, \{M. C.\}",

year = "1986",

month = jun,

doi = "10.1007/BF01731532",

language = "English",

volume = "5",

pages = "633--634",

journal = "Journal of Materials Science Letters",

issn = "0261-8028",

publisher = "Chapman \& Hall",

number = "6",

}

TY - JOUR

T1 - Mixing of phosphorus and antimony ions in silicon by recoil implantation

AU - Kwok, H. L.

AU - Lam, Y. W.

AU - Wong, S. P.

AU - Poon, M. C.

PY - 1986/6

Y1 - 1986/6

UR - https://www.scopus.com/pages/publications/0022740080

U2 - 10.1007/BF01731532

DO - 10.1007/BF01731532

M3 - Article

AN - SCOPUS:0022740080

SN - 0261-8028

VL - 5

SP - 633

EP - 634

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 6

ER -