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Fabrication and characterization of porous polycrystalline silicon resistive sensor

  • P. G. Han
  • , H. Wong
  • , M. C. Poon

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A thin layer of p-type anodized porous polycrystalline silicon (PPS) are formed on n-type epitaxial crystal silicon wafer. The sensitivity of the resistors based on this PPS has been characterized and analyzed at different ambient pressures and temperature as well as gas species. Results show that the current-voltage characteristics are highly sensitive to the ambient pressure and organic gases. In addition, the effects of illumination and temperature are also studied.

Original languageEnglish
Title of host publicationProceedings - 1998 IEEE Hong Kong Electron Devices Meeting, HKEDM 1998
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages152-156
Number of pages5
ISBN (Electronic)0780349326, 9780780349322
DOIs
StatePublished - 1998
Externally publishedYes
Event5th IEEE Hong Kong Electron Devices Meeting, HKEDM 1998 - Hong Kong, Hong Kong
Duration: 29 Aug 199829 Aug 1998

Publication series

NameProceedings - 1998 IEEE Hong Kong Electron Devices Meeting, HKEDM 1998
Volume1998-August

Conference

Conference5th IEEE Hong Kong Electron Devices Meeting, HKEDM 1998
Country/TerritoryHong Kong
CityHong Kong
Period29/08/9829/08/98

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