Effects of NH3 plasma pretreatment on the growth of carbon nanotubes

Shuxia Wang, Peng Wang, Otto Zhou

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

In CVD, it is believed that the catalyst is a crucial parameter for the diameter and the density of the CNTs. Typical thin catalyst film thickness should be less than 20 nm. While the catalyst film thickness is more than 30 nm, it is very difficult to grow thinner CNTs. Pretreatment further to break the film into desired particles should be taken. In this paper, the pretreatment effect of NH3 plasma on CNT growth was studied. Multi-wall carbon nanotubes have been grown with NH3 plasma pretreatment to the thick catalyst films by CVD. The diameter and density of CNTs changed with the plasma power and pretreatment time. The diameter of grown CNTs decreased from 10 to 4 nm as plasma intensity increased. NH3 plasma power and pretreatment time have to be optimized in order to grow uniform and density controlled nanotubes.

Original languageEnglish
Pages (from-to)361-364
Number of pages4
JournalDiamond and Related Materials
Volume15
Issue number2-3
DOIs
StatePublished - Feb 2006
Externally publishedYes

Keywords

  • CVD
  • Carbon nanotube
  • Catalyst
  • NH plasma

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