Broadband antireflection of silicon nanorod arrays prepared by plasma enhanced chemical vapor deposition

Desheng Wang, Zhibo Yang, Fei Li, Dequan Liu, Peng Wang, Deyan He

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Hydrogenated nanocrystalline Si (nc-Si:H) nanorod arrays were cost-effectively prepared on electrodeposited nickel nanocones substrates by very high frequency plasma enhanced vapor deposition. The antireflection properties of the obtained Si nanorod arrays were investigated carefully for the possible application in solar cells. It was found that the structures of nc-Si:H nanorod arrays can be tuned to obtain a very low reflectance especially in the near infrared region. The obtained Si nanostructure with well-separated nanorods, each of which had an average diameter of 200 nm and height of 700 nm, showed a reflectance value of <5% at normal incident over a wide wavelength of 400-1100 nm.

Original languageEnglish
Pages (from-to)1058-1061
Number of pages4
JournalApplied Surface Science
Volume258
Issue number3
DOIs
StatePublished - 15 Nov 2011
Externally publishedYes

Keywords

  • Antireflection
  • Electrodeposition
  • Si nanorods
  • VHF-PECVD

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