Tianjin University of Technology Researchers Describe Recent Advances in Chemical Vapor Deposition (Source-modulated controllable growth and mechanism exploration of 2D MoS2 deposited by NaCl-assisted CVD)

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Period27 Jan 2026

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  • TitleTianjin University of Technology Researchers Describe Recent Advances in Chemical Vapor Deposition (Source-modulated controllable growth and mechanism exploration of 2D MoS2 deposited by NaCl-assisted CVD)
    Media name/outletTech Daily News
    Country/TerritoryUnited States
    Date27/01/26
    PersonsPeng Wang
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